NE-327: Nanoelectronics Device Fabrication and Characterization  (3:1)

E3-327: Nanoelectronics Device Fabrication and Characterization  (3:0)

(August 2012)

Course Instructors : Navakanta Bhat, S. A. Shivashankar, K. N. Bhat

Lab Instructors: Lab Staff

Lecture Schedule : Monday, Wednesday and Friday 9:00am-10:00am in EC 1.08

Lab Schedule : Tuesday - Thursday , 2:00pm - 6:00pm

 

Reference books for Device Physics

“Fundamentals of Modern VLSI Devices” by Taur and Ning, Cambridge University Press

“Solid State Electronic Devices” by Streetman and Banerjee

“Fundamentals of Electronic Devices” by Achutan and Bhat, McGraw Hill

"MOS (Metal Oxide Semiconductor) Physics and Technology" by E.H. Nicollian and J.R.Brews, Wiley Publishers.

 

Reference books for Semiconductor Process Technology and Characterization

“Silicon VLSI Technology” by Plummer, Deal, and Griffin

“ULSI Technology” by S. M. Sze, McGraw Hill

“Encyclopedia of Materials Characterization” Edited by Brundle, Evans, Wilson, Elsevier

 

Recent papers from journals and conferences

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Lecture material and related documents for download 

 

Practice Problems

(Solving these problems will help you answer questions in quiz and test)

 

Lecture 1 : Introduction

Slides for Lecture 1   

   
IISc Journal :  Review paper on Nanoelectronics

Physics News :   Nanoelectronics an Overview

 

Lecture 2 : Constant Electric Filed Scaling theory, Generalized scaling, Non scaling factors

Slides for Lecture 2    

 

Dennard’s Scaling Theory Paper IEEE Journal of Solid-State Circuits, Vol. 9 (October 1974) pp. 256-268

 

Special Issue of SSCS news letter on Impact of Dennard’s scaling theory (Read through several interesting articles from Page 11)

 

Fowler Nordheim Tunneling

 

Direct Tunneling Model

 

Review paper on High-k  

 

Meatl gate review paper 

 

FUSI review paper

 

CMOS Scaling and Process Flow  

 

IEDM Proceedings papers on representative CMOS Technologies

 

Intel 180nm CMOS

 

Intel 130nm CMOS

 

Intel 90nm CMOS

 

Intel 65nm CMOS

 

Intel 45nm CMOS

 

Intel 32nm CMOS

 

Extraction of Dit from CV  

 

Solutions for Quiz papers

 

Quiz 1 Solution1

 

Quiz 2 Solution1

 

Quiz 3 Solution1

 

Quiz 4 Solution1

 

Quiz 5 Solution1